The CSSC-5 inaugurated the "Ulrich Gösele Young Scientist Award." We invited young scientists (younger than or equal to 37 years of age by the start of the workshop) whose technical work has contributed to innovations in crystalline silicon feedstock refining, crystallization, wafer fabrication, or defect engineering to apply for this new award.

Ulrich Gösele was a was Scientific Director of the Max-Planck Institute for Microstructure Physics. Among his many scientific contributions, he excelled at revealing the underlying physics of defects and impurities in silicon, namely carbon and oxygen. He was an excellent scientist, but also held industrial applications in high esteem, frequently collaborating with industry, e.g., to advance the science and technology of wafer bonding. Like the international flavor of the CSSC workshop, Prof. Gösele understood the value of international collaboration: he was a professor at Duke University; a visiting scientist at NNT LSI Laboratories, Harvard University, and IBM Watson Research Center; an honorary professor at the Chinese Academy of Sciences. He was, above all, dedicated to developing young scientific talent, spending hours engaging in scientific discussion with the youngest members of his institute. It is in his honor, and with the permission of his family, that we institute the Ulrich Gösele Young Scientist Award at the CSSC-5.

11/9 update: Congratulations to Dr. Nathan Stoddard, winner of the inaugural Ulrich Gösele Young Scientist Award, for his contributions toward industrial development of monocrystalline ingot casting!

Nathan receives the prize, and shares a few words about the development of monocrystalline ingot casting.

Lars Arnberg (award chair), Nathan Stoddard, George Rozgonyi (Nathan's Ph.D. advisor), and Tonio Buonassisi (workshop chair).